This electron micrograph was done by Dr. Michael Rooks in 1986, then a graduate student in Physics working with Daniel Prober. It shows an ultrasmall pattern written with electron-beam lithography. The light areas are a gold pattern on an oxidized silicon substrate. At that time, it was close to the state-of-the-art for writing in polymer electron resist.

Dr. Rooks continues to work in nanofabrication at IBM Thomas J. Watson Laboratory in Yorktown heights, NY.

Submitted by Daniel Prober